Inside ASML's High NA EUV tool, lasers blast 50,000 tin droplets a second to make light.
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＼想像を超える"なめらか"な半導体製造の世界🪞／ ASMLのHigh-NA EUVリソグラフィシステムに使われるミラーには、極限までの”なめらかさ”が求められます。 その最大許容差はわずか数十ピコメートル。これは地球サイズの表面にトランプカード1枚分の凹凸がある程度に相当します。 世界最高水準である8ナノメートルの解像度を実現するためには、直径1メートルものミラーでこの精度を達成する必要がありました。ミラーの設計は非常に難しく、私たちASMLは戦略パートナーであるZEISSと密に連携することで、この技術を実現することができたのです。 これからもASMLは、次世代の半導体チップ製造を支える革新的技術の開発に取り組んでいきます。 #ASML | ASML
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